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Photomechanical Prints: History, Technology, Aesthetics, and Use

Event Details

Photomechanical Prints: History, Technology, Aesthetics, and Use

Time: October 30, 2023 to November 3, 2023
Location: Washington, D.C. USA
Website or Map: https://learning.culturalheri…
Event Type: symposium
Organized By: FAIC
Latest Activity: Feb 20

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Event Description

The Foundation for Advancement in Conservation (FAIC) is pleased to announce Photomechanical Prints: History, Technology, Aesthetics, and Use. The meeting will be held in Washington, D.C. the week of October 30th – November 3rd, 2023, and will consist of a three-day symposium hosted by the National Gallery of Art flanked by two days of workshops and tours of local collections. Distinguished specialists will provide lectures focused on contemporary and historic photomechanical print production including aspects of invention, adaptation, materiality, cultural impact, market value, artistic significance, and preservation. Hands-on workshops will allow smaller groups to intensify their study of identification techniques or try their hand at printing processes with the instruction of world-renowned practitioners. Tours of prominent local collections will allow participants to see a wide range of examples of historic and contemporary prints. The program overall will provide an opportunity for conservators, curators, historians, scientists, collections managers, catalogers, archivists, librarians, educators, printmakers, artists, and collectors to convene and collaborate while studying all aspects of photomechanical printing. The resulting advancement of our collective understanding of these ubiquitous but under-researched materials will allow for new interpretations and improved approaches to their collection, interpretation, preservation, treatment, and display.

Please visiti the event webpage:

to submit an abstract by October 31, 2022.

The full program will be announced, and registration will open in the spring of 2023. We invite you to please begin considering your proposals and we encourage you to save the date and plan to participate in this unique event. FAIC follows the health and safety guidelines put in place by local authorities and host institutions of in-person events. The dates and format of this program are subject to change.


This event is presented by FAIC's Collaborative Workshops in Photograph Conservation. Scholarship and sponsorship opportunities will be available. For more information about this program, contact


Photomechanical Prints Symposium Planning Committee

Alisha Chipman, Senior Photograph Conservator, Library of Congress

Martin Jürgens, Conservator of Photographs, Rijksmuseum

Shannon Perich, Curator, History of Photography Collection, National Museum of American History

Rachel Mustalish, Paper Conservator, The Metropolitan Museum of Art

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